Negative resist for high energy radiation

Details Negative resist for high energy radiation Negative resist for high energy radiation

1980-02-15

1981-11-17

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430296, 427 431, 20415913, 526242, 526279, G03C 168

Patent

active

043012310

ABSTRACT:
Negative resist materials comprising soluble, film-forming polymers with side branches containing vinyl silyl groups are used for pattern generation on exposure to high energy radiation such as electron beams or X-rays.

REFERENCES:
patent: 2982757 (1961-05-01), Lewis
patent: 3657164 (1972-04-01), Jastrow et al.
patent: 4151158 (1979-04-01), Poddubny et al.
Yatsui et al., J. Electrochem. Soc. Solid State Science, vol. 116, No. 1, pp. 94-97, Jan. 1969.

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