Negative resist compositions

Details Negative resist compositions Negative resist compositions

1987-03-16

1989-01-24

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430914, 430919, 430921, 430925, 430927, 522 31, 522 32, 522154, 522112, 522129, G03C 171

Patent

active

048001520

ABSTRACT:
Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light X-ray and electron beams. The composition comprises an acid generating onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.

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patent: 4284707 (1981-08-01), Nagasawa et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4640937 (1987-02-01), Hanyuda
patent: 4690957 (1987-09-01), Fujioka et al.
R. Morrison and Robert Boyd, Organic Chemistry, 3rd ed, Allyn and Bacon, Inc., 1973, pp. 642-643.
Pappas, S. P., Photogeneration of Acid: Part 6-A Review of Basic Principles for Resist Imaging Applications, Journal of Imaging Technology, vol. 11 (1985), Aug. No. 4, pp. 146-157.
Robert Morrison and Robert Boyd, Organic Chemistry, 3rd ed., Allyn and Bacon, Inc., 1973, pp. 642-643.
W. F. Feeley et al., Proceedings from the 7th Int'l. Technical Conference on Photopolymers, SPE 49 (1985).

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