Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2007-06-05
2007-06-05
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
Reexamination Certificate
active
11434536
ABSTRACT:
A negative resist composition and a patterning method for semiconductor devices using the composition are provided. In one aspect, a negative resist composition comprises an alkali-soluble base polymer having an epoxy ring substituent, a silicon-containing crosslinker having multiple hydroxy groups, and a photoacid generator. In another aspect, a patterning method includes using the negative resist composition in a bi-layer resist process to form fine patterns.
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patent: 5886102 (1999-03-01), Sinta et al.
patent: 2002/0031718 (2002-03-01), Hashimoto et al.
patent: 0 466 025 (1992-01-01), None
patent: 0 506 432 (1992-03-01), None
F. Chau & Associates LLC
Hamilton Cynthia
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