Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-06-12
2010-02-02
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S905000, C430S907000, C430S330000
Reexamination Certificate
active
07655378
ABSTRACT:
There is disclosed a negative resist composition comprising, at least, a polymer comprising a repeating unit of hydroxy vinylnaphthalene represented by the following general formula (1). There can be provided a negative resist composition, in particular, a chemically amplified negative resist composition that can exhibit higher resolution than conventional hydroxy styrene or novolac negative resist compositions, that provides excellent pattern profiles after being exposed and that exhibits excellent etching resistance; and a patterning process that uses the resist composition.
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patent: 2007/0275325 (2007-11-01), Hatakeyama et al.
patent: WO 2004/074242 (2004-09-01), None
Matsuzawa, Nobuyuki N. et al., “Theoretical Calculation Of Photoabsorption Of Various Polymers In An Extreme Ultraviolet Region,” J. Appl. Phys., vol. 38, Part 1, No. 12B, pp. 7109-7113, Dec. 1999.
Hatakeyama Jun
Takeda Takanobu
Lee Sin J.
Oliff & Berridg,e PLC
Shin-Etsu Chemical Co. , Ltd.
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