Negative resist composition and method of forming resist...

Details Negative resist composition and method of forming resist... Negative resist composition and method of forming resist...

2008-10-24

2009-10-06

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S330000, C430S905000, C430S907000, C430S910000

Reexamination Certificate

active

07598017

ABSTRACT:
A negative resist composition including:a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group,an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F),an acid generator component (B) that generates acid upon exposure, anda cross-linking component (C).[wherein, R7represents a fluorinated alkyl group, and a represents either 0 or 1.]

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