Negative resist composition and method of forming resist...

Details Negative resist composition and method of forming resist... Negative resist composition and method of forming resist...

2011-07-19

2011-07-19

Kelly, Cynthia H (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

Reexamination Certificate

active

07981588

ABSTRACT:
There are provided a resist composition capable of forming a resist pattern with high sensitivity and high resolution, and a method of forming such a resist pattern. The negative resist composition includes an alkali soluble base component (A), an acid generator component (B) that generates acid by exposure, and a cross-linking agent component (C), wherein the base component (A) includes a polyhydric phenol compound (A1) containing two or more phenolic hydroxyl groups represented by the following general formula (I), with a molecular weight of 300 to 2500.

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