Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-07-26
2009-02-10
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S326000, C430S313000, C430S270100, C430S323000
Reexamination Certificate
active
07488569
ABSTRACT:
A negative resist composition containing an alkaline-soluble resin as a base material, in which an oxetane structure represented by the following formula (1):is contained in a structure of the alkaline-soluble resin or in a structure of a compound used in combination with the alkaline-soluble resin, is disclosed.
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Kozawa Miwa
Nozaki Koji
Watanabe Keiji
Yano Ei
Fujitsu Limited
Hamilton Cynthia
Kratz Quintos & Hanson, LLP
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