Negative resist composition

Details Negative resist composition Negative resist composition

2006-08-15

2006-08-15

Hamilton, Cynthia (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

Reexamination Certificate

active

07090960

ABSTRACT:
A negative resist composition comprising (A) an alkali-soluble polymer, (B) a cross-linking agent forming cross-links between molecules of the alkali-soluble polymer (A) under the action of an acid and (C) a specified acid generator, which can satisfy all of performance requirements concerning sensitivity, resolution, pattern profile and line-edge roughness in the pattern formation by irradiation with electron beams or X-rays.

REFERENCES:
patent: 5296332 (1994-03-01), Sachdev et al.
patent: 6031014 (2000-02-01), Crivello
patent: 6074800 (2000-06-01), Breyta et al.
patent: 6329119 (2001-12-01), Suetsugu et al.
patent: 6528232 (2003-03-01), Maeda et al.
patent: 2003/0124456 (2003-07-01), Shirakawa et al.
patent: 10054550 (2001-05-01), None
patent: 2000-292917 (2000-10-01), None
patent: 2001-294570 (2001-10-01), None
Derwent-Acc-No. 2001-484005, Derwent-Week 200462, Hasegawa et al, JP 3567984 B2, 3 pages, Derwent Information LTD, copyrign 2005.
Ferreira et al, “Choice of Amines as Stabilizers for Chemically Amplified Resist Systems”, SPIE vol. 333, pp. 236-244, Jun. 1998 editor : Will Conley. Advances in Resist Technology and Processing XV.

Affiliated with

Also associated with

Rating

Negative resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Negative resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative resist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3668413