Negative resist composition

Details Negative resist composition Negative resist composition

2005-05-03

2005-05-03

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S296000, C430S914000, C430S325000, C430S966000, C430S942000

Reexamination Certificate

active

06887645

ABSTRACT:
A negative resist composition comprises:(A) an alkali-soluble resin;(B) a compound capable of generating an acid upon irradiation with a radiation;(C) a crosslinking agent capable of crosslinking by the action of an acid; and(D) a solvent mixture containing: at least one solvent selected from the group A below; and at least one selected from the group consisting of the group B below and the group C below:group A: a propylene glycol monoalkyl ether carboxylate;group B: a propylene glycol monoalkyl ether, an alkyl lactate, an acetic ester, a chain ketone and an alkyl alkoxypropionate;group C: a γ-butyrolactone, an ethylene carbonate and a propylene carbonate.

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