Negative resist and radical scavenger composition with capabilit

Details Negative resist and radical scavenger composition with capabilit Negative resist and radical scavenger composition with capabilit

1979-07-23

1981-07-21

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415914, 20415918, 20415923, 430296, 430309, 430917, G03C 168

Patent

active

042799864

ABSTRACT:
A lithographic resist for use in microfabrication comprising a negative-type resist containing a radical scavenger capable of preventing post-irradiation reaction.

REFERENCES:
patent: 3864133 (1975-02-01), Hisamatsu et al.
patent: 3989610 (1976-11-01), Tsukada et al.
patent: 4025348 (1977-05-01), Tsukada et al.
patent: 4097283 (1978-06-01), Asano et al.
patent: 4130424 (1978-12-01), Feit et al.
Billmeyer, Textbook of Polymer Science, (1971), pp. 285-286.
Vollmert, Polymer Chemistry, (1973), pp. 61-63.

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