Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-12-28
2000-12-12
Nuzzolillo, Maria
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302811, 4302831, G03C 173
Patent
active
06159654&
ABSTRACT:
A negative photosensitive polymer composition, which comprises a thermosetting polymer precursor which can be cured through cyclodehydration upon heating, and a photosensitive heat cure accelerator which is capable of accelerating a curing upon irradiation of light (cyclodehydration accelerating property). This photosensitive heat cure accelerator may be a compound which is capable of increasing molecular weight and raising volatilization temperature upon irradiation of light, or a compound which is capable of generating a carboxyl group upon irradiation of light thereby exhibiting a heat cure-accelerating property, and is formed of an aromatic hydrocarbon or aromatic heterocyclic compound having at least one hydroxyl group, substituted or unsubstituted amino group or mercapto group.
REFERENCES:
patent: 4448869 (1984-05-01), Kondo et al.
patent: 4503140 (1985-03-01), Wright
patent: 5585217 (1996-12-01), Oba
M Oba et al, "Synthesis and Evaluation of Positive-Acting Photosensitive Polyimides with Phenol Moety", Journal of Applied Polymer Science, vol. 58, 1995, pp. 1535-1542.
M. Oba, "Effect of Curing Accelerators on Thermal Imidization of Polyamic Acids at Low Temperature", Journal of Polymer Science: Part A: Polymer Chemistry, vol. 34, 1996, pp. 651-658.
M. Oba, "Effect of Cure Accelerator on Imidization of Polyamic Acid at Low Temperature", Polymer Preprints, vol. 43, No. 7, 1994, pp. 2087-2088.
Zhubanov, B.A. et al, Polycondensation opf Tricyclodecenetracarboxylic Dianhydride with Diaminodiphenyl Oxide in the Presence of Poly(4-vinylpyridine), Vysokaomol. Soedin., Ser. A (1986), 28(8), pp. 1653-1657.
An, Jeongwoong et al, "Micro-composite Systems by in-situ Formation of Liquid Crystal Polymers in Commodity Polymers", Macromol. Symp. (1995), 96 (International Conference on Liquid Crystal Polymers, 1994), pp. 111-123.
Makhija, S. et al, "Miscibility Studies in Blends of High-temperature Polymers", Polym. Mater. Sci. Eng. (1990), 63, pp. 498-504.
Durr, Heinz et al, "Preparation of Photochromic Molecules with Polymerizable Organic Functionalities", Synthesis (3), pp. 294-298, 1995.
Kawamonzen Yoshiaki
Machida Shigeru
Oba Masayuki
Kabushiki Kaisha Toshiba
Nuzzolillo Maria
Weiner Laura
LandOfFree
Negative photosensitive polymer composition of a thermosetting p does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Negative photosensitive polymer composition of a thermosetting p, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative photosensitive polymer composition of a thermosetting p will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-215066