Negative photosensitive composition and method for forming patte

Details Negative photosensitive composition and method for forming patte Negative photosensitive composition and method for forming patte

1994-06-03

1996-06-25

Dote, Janis L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 430330, 430927, 522 63, 522126, 522134, G03C 173, G03F 7038, G03F 738

Patent

active

055298850

ABSTRACT:
Disclosed are a negative photosensitive composition comprising an alkali-soluble resin, a photo acid generating system, and a crosslinking agent for the alkali-soluble resin which acts on the resin under acidic conditions, in which the crosslinking agent is a highly-alkylated alkoxymethylmelamine resin having a monomer content of from 5 to 40% by weight, and a method for forming a negative photo-resist pattern using the composition. The resist composition is stable during storage and gives good pattern profiles having high aspect ratios even though the resist film is made thick.

REFERENCES:
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patent: 4160671 (1979-07-01), Stahlhofen
patent: 5034304 (1991-07-01), Feely
patent: 5180653 (1993-01-01), Miyabe et al.
patent: 5204225 (1993-04-01), Feely
patent: 5286600 (1994-02-01), Ochiai
patent: 5292614 (1994-03-01), Ochiai et al.
patent: 5368783 (1994-11-01), Kobayashi et al.

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