Negative photosensitive composition and method for forming a res

Details Negative photosensitive composition and method for forming a res Negative photosensitive composition and method for forming a res

1992-07-27

1994-03-08

Kight, III, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 522 63, 522126, 522 51, C08F 246, C08F 404

Patent

active

052926141

ABSTRACT:
A negative photosensitive composition comprising an alkali-soluble resin, a photo-acid-generating material and a crosslinking agent for the alkali-soluble resin, which acts under an acidic condition, wherein the crosslinking agent is a compound of the following formula (I): ##STR1## wherein each of A.sup.1 to A.sup.10 which are independent of one another, is a hydrogen atom, --CH.sub.2 OH or --CH.sub.2 OR, wherein R is C.sub.1 -C.sub.4 linear or branched chain alkyl, and X is C.sub.2 -C.sub.10 linear or branched chain alkylene, provided that at least four among A.sup.1 to A.sup.10 are --CH.sub.2 OR, and a plurality of --CH.sub.2 OR may be the same or different.

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