Negative photoresists of the polyimide type containing 1,2-disul

Details Negative photoresists of the polyimide type containing 1,2-disul Negative photoresists of the polyimide type containing 1,2-disul

1989-03-09

1990-12-25

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430281, 430330, 430921, 430927, 522 59, G03F 7025, G03C 1725

Patent

active

049802682

ABSTRACT:
The invention relates to negative photoresists of the polyimide type essentially containing, in an organic solvent, in each case at least

REFERENCES:
patent: 4040831 (1977-08-01), Rubner et al.
patent: 4329419 (1982-05-01), Goft et al.
patent: 4565767 (1986-01-01), Kataoka et al.
Chemical Abstracts, vol. 99, 1983, p. 38 (99: 140979o).
Physical Org., vol. 78, 1973, p. 15201, 1519c.
Makromol. Chem., Rapid Commun. 4, 539-541 (1983).
Light-Sensitive Systems: Chemistry and Application of Nonsilver Halide Photographic Processes, p. 167 (1974).

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