Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1984-10-31
1986-09-30
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430270, 430272, 430311, 522155, 522153, 526293, 526291, 526284, G03C 171, C08F 800
Patent
active
046147039
ABSTRACT:
A novel class of copolymeric negative photoresists is provided whose sensitivity is based upon the presence of .alpha.-chloro ketone moieties. The general structure for the monomers from which the copolymers can be formed is: ##STR1## where R is a substituent selected from 1 to 6 carbon alkyl and halogen substitutes alkyl, phenyl, and halogen substituted phenyl and napthyl and the comonomers are comonomers selected from the group consisting of 1-4 carbon alkyl acrylates and methacrylates, styrene vinyl toluene and vinyl acetate and may include additionally other comonomers that are compatible and have the polymerizable >C.dbd.C< group. The copolymers form crosslinked networks and provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm. When used in negative photoresist compositions, these chloro vinyl methyl ketone containing compounds produce a high resolution and thus higher information density in microcircuits manufactured using these photoresists.
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Allied Corporation
Friedenson Jay P.
Hamilton Cynthia
Henry Patrick L.
Kittle John E.
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