Negative photoresists containing aminoacrylate salts

Details Negative photoresists containing aminoacrylate salts Negative photoresists containing aminoacrylate salts

1991-12-04

1995-03-21

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430283, 522149, 522164, G03C 173

Patent

active

053994604

ABSTRACT:
Negative photoresists, and electronic devices comprising dielectric polyimide films resulting from such photoresists. The Photoresists comprise polyamic acids, which have been neutralized with tertiary amines containing double bonds of the acrylic family, the amines including acrylamines, alkylacrylamines such as for example methacrylamines, ethacrylamines, and the like. Also methods of making such amines in high purity.

REFERENCES:
patent: 2893868 (1959-07-01), Barney
patent: 4243743 (1981-01-01), Hiramoto et al.
patent: 4608333 (1986-08-01), Ohbayashi et al.
patent: 5019482 (1991-05-01), Ai et al.

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