Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2005-10-26
2008-09-02
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S910000, C430S912000, C430S324000
Reexamination Certificate
active
07419769
ABSTRACT:
A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition is applied onto a substrate and thereby yields a photoresist film 5 to 100 μm thick. Likewise, the composition is applied onto a substrate of an electronic part, is patterned, is plated and thereby yields a bump.
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Komano Hiroshi
Misumi Kouichi
Okui Toshiki
Saito Koji
Hamilton Cynthia
Hoffmann & Baron , LLP
Tokyo Ohka Kogyo Co. Ltd.
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