Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-06-20
2006-06-20
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S270100, C430S176000, C430S272100, C430S315000
Reexamination Certificate
active
07063934
ABSTRACT:
A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition is applied onto a substrate and thereby yields a photoresist film 5 to 100 μm thick. Likewise, the composition is applied onto a substrate of an electronic part, is patterned, is plated and thereby yields a bump.
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Komano Hiroshi
Misumi Kouichi
Okui Toshiki
Saito Koji
Hamilton Cynthia
Hoffmann & Baron , LLP
Toyko Ohka Kogyo Co. Ltd.
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