Negative photoresist compositions

Details Negative photoresist compositions Negative photoresist compositions

2006-03-28

2009-10-13

Hamilton, Cynthia (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S905000, C430S910000, C430S916000, C430S914000

Reexamination Certificate

active

07601482

ABSTRACT:
The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1,where, R′ is selected independently from hydrogen, (C1-C4)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1,where, W is a multivalent linking group, R1to R6are independently selected from hydrogen, hydroxyl, (C1-C20) alkyl and chlorine, X1and X2are independently oxygen or N—R7, where R7is hydrogen or (C1-C20) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.

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