Negative photoresist composition comprising a photosensitizer of

Details Negative photoresist composition comprising a photosensitizer of Negative photoresist composition comprising a photosensitizer of

1991-11-29

1992-07-07

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430925, 430919, 430923, 430905, 430945, 522 2, 522 67, 522 45, 522 59, 522 63, 522 53, 522150, 522 65, G03F 7038

Patent

active

051282313

ABSTRACT:
A photoresist composition is disclosed. The photoresist composition comprises a base resin, a photosensitizer, and a solvent. The base resin comprises polyhydroxystyrene represented by the following structural formula (I): ##STR1## (wherein k is a positive integer). The photosensitizer comprises a polyhalogen compound(s). The photoresist composition of the present invention has dry etching resistance characteristics comparable to those of conventional positive novolak photoresist compositions and can form a resist pattern with a high resolution and vertical sidewall profiles. This makes microprocessing possible.

REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 3793033 (1974-02-01), Mukherjee
patent: 4789619 (1988-12-01), Ruckert et al.
patent: 4840867 (1989-06-01), Elsaesser et al.
patent: 4840869 (1989-06-01), Kita et al.
patent: 5034304 (1991-07-01), Feely
A. Bruns et al., Microelectronic Engineering 6(1987) 467-471.

Affiliated with

Also associated with

Rating

Negative photoresist composition comprising a photosensitizer of does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Negative photoresist composition comprising a photosensitizer of, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative photoresist composition comprising a photosensitizer of will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1829089