Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-06-18
1999-02-02
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302701, 430325, 430920, G03C 500
Patent
active
058662995
ABSTRACT:
A photoresist composition and process that minimizes the effect of photogenerated acid migration. The photoresist comprises an alkali soluble resin, a photoacid generating compound that undergoes photolysis within a wavelength of from 330 to 700 nm to yield a strong acid, a crosslinking agent capable of crosslinking the composition when activated by photogenerated hydrohalide acid and a buffer comprising a mixture of an organic carboxylic acid and a strong base having a pK.sub.b of 5 or less present in a concentration sufficient to immobilize from 0.1 to 25 mole percent of photogenerated acid. The buffer is responsible for immobilization of the acid.
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Szmanda Charles R.
Trefonas, III Peter
Ashton Rosemary
Baxter Janet
Corless Peter F.
Frickey Darryl P.
Goldberg Robert L.
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