Negative photoresist composition

Details Negative photoresist composition Negative photoresist composition

1999-09-30

2000-10-17

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430906, 430920, 430926, G03F 7004

Patent

active

061329304

ABSTRACT:
A negative photoresist composition is disclosed which is excellent in sensitivity and resolution, tenaciously adheres to substrates, and can be advantageously used in practical production processes. Two 1,4-dihydropyridine derivatives each having a specific structure are incorporated as photosensitizers into a polyamic acid to obtain the negative photoresist composition.

REFERENCES:
patent: 5081000 (1992-01-01), Kuehn et al.
patent: 5665523 (1997-09-01), Omote et al.
patent: 5858518 (1999-01-01), Omote et al.
patent: 5861235 (1999-01-01), Harkness et al.

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