Negative photoresist based on polyphenols and selected epoxy or

Details Negative photoresist based on polyphenols and selected epoxy or Negative photoresist based on polyphenols and selected epoxy or

1988-07-20

1991-02-19

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 430907, 430914, G03C 168, G03C 171, G03C 1727

Patent

active

049943464

ABSTRACT:
The present invention relates to a negative photoresist essentially comprising

REFERENCES:
patent: 4256828 (1981-03-01), Smith
patent: 4624912 (1986-11-01), Zwelpel et al.

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