Negative photoresist based on polyphenols and epoxy compounds or

Details Negative photoresist based on polyphenols and epoxy compounds or Negative photoresist based on polyphenols and epoxy compounds or

1989-11-30

1992-01-07

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430288, 430281, 430176, 430905, 522 31, 522 66, 522121, 522120, 522129, 522141, 522142, 522146, G03F 7029, G03F 7033, G03F 7037, G03F 7004

Patent

active

050791290

ABSTRACT:
The present invention relates to a negative photoresist consisting essentially of

REFERENCES:
patent: 3030332 (1962-04-01), Lombardi et al.
patent: 3497353 (1970-02-01), Steppan et al.
patent: 3558535 (1971-01-01), Rushton et al.
patent: 3708296 (1973-01-01), Schlesinger
patent: 3869292 (1975-03-01), Peters
patent: 3936557 (1976-02-01), Watt
patent: 4090936 (1978-05-01), Barton
patent: 4148654 (1979-04-01), Oddi
patent: 4193799 (1980-03-01), Crivello
patent: 4273889 (1981-06-01), Yamazaki et al.
patent: 4289699 (1981-11-01), Oba et al.
patent: 4339567 (1982-07-01), Green et al.
patent: 4383025 (1983-05-01), Green et al.
patent: 4398014 (1983-08-01), Green et al.
patent: 4407759 (1983-10-01), Crivello
patent: 4442197 (1984-04-01), Crivello et al.
patent: 4537854 (1985-08-01), Crivello
patent: 4549008 (1985-10-01), Renner et al.
patent: 4579916 (1986-04-01), Schmid et al.
patent: 4593051 (1986-06-01), Koleske
patent: 4624912 (1986-11-01), Zweifel et al.
patent: 4632971 (1986-12-01), Cavitt
patent: 4678737 (1987-07-01), Schneller et al.
K. Meier and H. Zweifel, "Photoinitiated Cationic Polymerization of Epoxides with Iron-Arene Complexes", Journal of Radiation Curing, Oct., 1986, pp. 526-532.
C.A., 104, 43202a (1986).
C.A., 105, 62301w (1986).
C.A., 100, 105179b (1984).
C.A., 102, 176532p (1985).
Derwent Abst. 85-132647/22.
C.A. 103:55104n (1985), Chemical Abstracts of Japanese Laid Open at Patent Application 60-51,770 (Mar. 23, 1985).
Patent Abst. of Japan, vol. 6, No. 237 (1982).
C.A. 70:68780 (1969).
C.A. 103:132418x (1985).
Patent Abst. of Japan, vol. 9, No. 299.

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