Negative photoresist and use thereof

Details Negative photoresist and use thereof Negative photoresist and use thereof

1989-04-17

1991-08-20

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430313, 430323, 430325, 522 31, 522166, 525487, 525507, G03C 173, G03F 7004

Patent

active

050413589

ABSTRACT:
A composition containing a polymeric material obtained by interreacting an epoxy-novolak polymer with an organosilicon compound, a radiation sensitive onium salt, and a near U.V. sensitizer.

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