Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-03-14
2006-03-14
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S905000, C430S906000, C430S907000, C430S909000, C430S910000, C430S914000, C430S921000, C430S311000, C430S313000
Reexamination Certificate
active
07011923
ABSTRACT:
A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The negative photoresist composition comprises a radiation sensitive acid generator, a first polymer containing an alkoxymethyl amido group and a hydroxy-containing second polymer. The first and second polymers may also have a repeating unit having an aqueous base soluble moiety. The first and second polymers undergo acid catalyzed crosslinking upon exposure of the acid to radiation, producing a product that is insoluble in an aqueous alkaline developer solution.
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Machine-assisted English translation of JP 9-325492 provided by JPO.
Li Wenjie
Varanasi Pushkara R.
Capella Steven
International Business Machines - Corporation
Lee Sin
Schmeiser Olsen & Watts
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