Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1983-11-25
1984-10-09
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415915, 20415916, 430287, 430288, 430905, 430910, G03C 168
Patent
active
044762151
ABSTRACT:
Negative-acting photoresist compositions are used in a variety of reproductive and imaging systems. Significant problems with these compositions are their inability to cure to a tough, solvent resistant state, tackiness in the uncured compositions, and the tendency of the uncured compositions to flow under force. The present composition combines six ingredients to form a photoresist composition which overcomes many of these problems in the prior art.
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Brammer Jack P.
Litman Mark A.
Minnesota Mining and Manufacturing Company
Sell Donald M.
Smith James A.
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