Near UV photoresist

Details Near UV photoresist Near UV photoresist

1991-06-28

1993-05-18

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430926, 430920, 430922, 430925, 522 50, 522 26, 522 25, 522 14, 522 16, 522126, 522146, G03C 7038

Patent

active

052120465

ABSTRACT:
A photoacid-generating photoresist composition sensitized with an aromatic, multi-ring, heterocylcic nitrogen containing sensitizer, preferably a ring extended phenothiazine derivative. The use of the sensitizer permits exposure of photoresists to near UV irradiation where such photoresists have heretofore been exposed to deep UV irradiation. The invention is especially useful for acid hardening photoresist systems.

REFERENCES:
patent: 3169868 (1965-02-01), Borden
patent: 3595664 (1971-07-01), Rust
patent: 4069054 (1978-01-01), Smith
patent: 4442197 (1984-04-01), Crivello et al.
patent: 4659649 (1987-04-01), Dickinson et al.
Burrows, Hugh D. et al., Excited States of Biological Molecules, Wiley, .COPYRGT.1974, pp. 116-127.
Muller, Paulette et al., J. Org. Chem., vol. 24, No. 37, 1959, pp. 37-39.

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