Near infrared ray activation type positive resin composition

Details Near infrared ray activation type positive resin composition Near infrared ray activation type positive resin composition

2005-07-22

2009-06-09

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S302000, C430S303000, C430S905000, C430S270150, C430S945000

Reexamination Certificate

active

07544461

ABSTRACT:
A near infrared ray activation type positive resist composition comprising(A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen,(B) a photothermal converting substance generating heat by a light in the near infrared region,(C) a thermal acid generator generating an acid by heat,can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.

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