Near-field optical probe based on SOI substrate and...

Details Near-field optical probe based on SOI substrate and... Near-field optical probe based on SOI substrate and...

2006-12-05

2009-06-23

Nguyen, Dao H (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Physical stress responsive

C438S050000, C438S053000, C438S066000, C438S637000, C438S666000, C257SE27006, C257SE21530, C257SE23078, C250S306000, C250S307000, C216S011000, C073S105000

Reexamination Certificate

active

07550311

ABSTRACT:
Provided is near-field optical probe including: a cantilever arm support portion that is formed of a lower silicon layer of a silicon-on-insulator (SOI) substrate, the cantilever arm support portion having a through hole formed therein at a side of the lower silicon layer; and a cantilever arm forming of a junction oxidation layer pattern and an upper silicon layer pattern on the SOI substrate that are supported on an upper surface of the lower silicon layer and each have a smaller hole than the through hole, a silicon oxidation layer pattern having a tip including an aperture at a vertical end, corresponding with the hole on the upper silicon layer pattern, and an optical transmission prevention layer that is formed on the silicon oxidation layer pattern and does not cover the aperture.

REFERENCES:
patent: 5202281 (1993-04-01), Ishibashi
patent: 5666190 (1997-09-01), Quate et al.
patent: 7393713 (2008-07-01), Kim et al.
patent: 1020040035497 (2004-04-01), None
patent: 1020050102158 (2005-10-01), None
“Fabrication of a High-Throughput Cantilever-Style Aperture Tip by the Use of the Bird's-Beak Effect.” Ki-Bong Song et al. © 2003 The Japan Society of Applied Physics. Jpn. J. Appl. Phys. vol. 42. pp. 4353-4356.
“SNOM/AFM microprobe integrated with piezoresistive cantilever beam for multifunctional surface analysis.” P. Grabiec et al. © 2002 Microelectronic Engineering 61-62. pp. 981-986.

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