Narrow write head pole tip fabricated by sidewall processing

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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Details

C029S603130, C029S603230, C205S119000

Reexamination Certificate

active

07127800

ABSTRACT:
The magnetic head includes a P2pole tip in which the P2pole tip material is electroplated upon a sidewall of the P2pole tip photolithographic trench. To accomplish this, a block of material is deposited upon a write gap layer, such that a generally straight, vertical sidewall of the block of material is disposed at the P2pole tip location. Thereafter, an electroplating seed layer is deposited upon the sidewall. A P2pole tip trench is photolithographically fabricated such that the sidewall (with its deposited seed layer) is exposed within the P2pole tip trench. Thereafter, the P2pole tip is formed by electroplating pole tip material upon the seed layer and outward from the sidewall within the trench. The width of the P2pole tip is thus determined by the quantity of pole tip material that is deposited upon the sidewall.

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IBM Technical Disclosure Bulletin, Vo. 40, No. 04, Apr. 1997, entitled: Sidewall Formation Using Silicon Nitride Mask for Horizontal/Planar Magnetic Heads.
IBM Technical Disclosure Bulletin, vol. 40, No. 04, Apr. 1997, entitled: Sidewall Process for Horizontal/Planar Magnetic Heads.

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