Narrow-band spectral filter and the use thereof

Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector

Reexamination Certificate

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C359S359000, C359S361000

Reexamination Certificate

active

07154666

ABSTRACT:
The invention relates to a narrow-band spectral filter. The aim of the invention is to reduce the radiation exposure of optical elements used in highly ultraviolet light by using an optical filter that is simple in construction and that preselects a wavelength band of a predetermined bandwidth. To this end, an optical filter is provided that comprises at least one zirconium, niobium, or molybdenum layer interposed between two silicon layers. In order to increase the mechanical stability and the service life of the filter and in order to further restrict the spectral characteristics, another two ruthenium or rhodium layers each can follow the silicon layers. The filters of this kind are especially used in illumination systems and projection illumination systems for highly ultraviolet light that are used in semiconductor lithography.

REFERENCES:
patent: 4870648 (1989-09-01), Ceglio et al.
patent: 5182670 (1993-01-01), Khan et al.
patent: 5581605 (1996-12-01), Murakami et al.
patent: 5965065 (1999-10-01), Powell
patent: 5978134 (1999-11-01), Chaton et al.
patent: 6013399 (2000-01-01), Nguyen
patent: 6153044 (2000-11-01), Klebanoff et al.
patent: 6228512 (2001-05-01), Bajt et al.
patent: 44 10 275 (1994-10-01), None
patent: 199 48 240 (2000-08-01), None
patent: 101 00 265 (2002-07-01), None
patent: 267 655 (1988-05-01), None
patent: 860 492 (1998-08-01), None
patent: 1 150 139 (2001-10-01), None
patent: 63008703 (1988-01-01), None
patent: 2053002 (1990-02-01), None
patent: WO 00/41875 (2000-07-01), None
Molybdenum-silicon Multilayer Monochromator for the Extreme Ultraviolet, T. T.W. Barbee, Jr, et al, Applied Physics Letters 50 (25), Jun. 22, 1987, XP-002202201.
Filter Windows for EUV Lithography, F.R. Powell et al, Emerging Lithographic Technologies V, Elisabeth A. Dobisz, Editor, Proceedings of SPIE vol. 4343, pp. 585-598 (2001).

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