Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1987-09-04
1989-05-16
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430495, 430945, 3461351, 548419, 548436, G11B 724, G01D 900, G03C 172, B41M 526
Patent
active
048309516
ABSTRACT:
Naphtholactamsquaric acid dyes of the formula ##STR1## where R.sup.1 and R.sup.2 independently of one another are each unsubstituted or substituted C.sub.3 -C.sub.22 -alkyl, in which the alkyl chain may be interrupted by oxygen atoms, or are each unsubstituted or substituted C.sub.1 -C.sub.4 -aralkyl, unsubstituted or substituted C.sub.5 -C.sub.7 -cycloalkyl or unsubsituted or substituted phenyl, and the rings A, B, C and D are unsubstituted or substituted and/or benzofused, and optical recording materials consisting of a base and a layer which is sensitive to laser light and is composed of a thermoplastic or crosslinked polymer and one or more dyes (I).
Because of the high light absorption of (I), the recording materials are very sensitive to light from the GaAlAs semiconductor laser. An excellent signal-to-noise ratio is obtained on reading the recordings.
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Barzynski Helmut
Benthack-Thoms Heidi
Dust Matthias
Hauser Peter
Kuppelmaier Harald
BASF - Aktiengesellschaft
Buscher Mark R.
Michl Paul R.
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