Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Reexamination Certificate
2007-01-02
2007-01-02
Rodee, Christopher (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
C430S078000, C546S066000
Reexamination Certificate
active
10768083
ABSTRACT:
Naphthalenetetracarboxylic acid diimide derivatives include a structure represented by the following formula:in which, R1, R2, and R3are each independently any one selected from the group consisting of hydrogen; halogen; substituted or unsubstituted alkyl of C1to C20; substituted or unsubstituted alkoxy of C1to C20; substituted or unsubstituted aryl of C6to C30; and substituted or unsubstituted aralkyl of C7to C30. An electrophotographic photoconductive material includes the naphthalenetetracarboxylic acid diimide derivatives as an electron transferring material.
REFERENCES:
patent: 1935945 (1933-11-01), Eckert et al.
patent: 2087133 (1937-07-01), Vollmann
patent: 3931224 (1976-01-01), Santa et al.
patent: 4442193 (1984-04-01), Chen et al.
patent: 4992349 (1991-02-01), Chen et al.
patent: 5468583 (1995-11-01), Gruenbaum et al.
patent: 5541169 (1996-07-01), Deushi et al.
patent: 5558965 (1996-09-01), Nguyen et al.
patent: 5886183 (1999-03-01), Langhals et al.
patent: 6287736 (2001-09-01), Takaki et al.
patent: 6391505 (2002-05-01), Hamasaki et al.
patent: 6472514 (2002-10-01), Kuroda
patent: 2003/0153005 (2003-08-01), Schmid et al.
patent: 2005/0130051 (2005-06-01), Kim et al.
patent: 2000-147806 (2000-05-01), None
patent: 2003-030306 (2000-11-01), None
patent: 2001-066805 (2001-03-01), None
patent: 2003-029436 (2003-01-01), None
Diamond, Arthur S & David Weiss (eds.) Handbook of Imaging Materials. New York: Marcel-Dekker, Inc. (Nov. 2001) pp. 381-382.
Borsenberger, Paul M et al. Organic Photoreceptors for Imaging Systems. New York: Marcel-Dekker, Inc. (1993) pp. 356-361.
Kim Beom-jun
Kim Seung-ju
Lee Hwan-koo
Yokota Saburo
Yon Kyung-yol
Rodee Christopher
Samsung Electronics Co,. Ltd.
Staas & Halsey , LLP
LandOfFree
Naphthalenetetracarboxylic acid diimide derivatives and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Naphthalenetetracarboxylic acid diimide derivatives and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Naphthalenetetracarboxylic acid diimide derivatives and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3743949