Nanotopography control and optimization using feedback from...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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C700S032000, C700S033000, C700S044000, C700S045000, C700S108000, C700S109000, C700S110000, C700S117000, C700S118000, C700S119000, C700S120000, C700S121000, C451S001000, C451S005000, C451S008000, C451S009000, C451S011000, C451S262000, C451S264000, C451S265000, C451S269000

Reexamination Certificate

active

07930058

ABSTRACT:
Processing a wafer using a double side grinder having a pair of grinding wheels. Warp data is obtained by a warp measurement device for measuring warp of a wafer as ground by the double side grinder. The warp data is received and a nanotopography of the wafer is predicted based on the received warp data. A grinding parameter is determined based on the predicted nanotopography of the wafer. Operation of the double side grinder is adjusted based on the determined grinding parameter.

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