Nanometer-scale ablation using focused, coherent extreme...

Details Nanometer-scale ablation using focused, coherent extreme... Nanometer-scale ablation using focused, coherent extreme...

2011-04-26

2011-04-26

Del Sole, Joseph S (Department: 1743)

Plastic and nonmetallic article shaping or treating: processes

Laser ablative shaping or piercing

C425S174400

Reexamination Certificate

active

07931850

ABSTRACT:
Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.

REFERENCES:
patent: 5444211 (1995-08-01), Nakata et al.
patent: 7251263 (2007-07-01), Rocca
U.S. Appl. No. 11/021,217, “Increased Laser Output Energy and Average Power at Wavelengths Below 35 nm,” by Jorge J. Rocca et al., filed Dec. 23, 2004.
A. Weith et al., “Continuous high-repetition-rate operation of collisional soft x-ray lasers with solid targets,” Optics Letters, pp. 1994-1996, vol. 31, No. 13, Jul. 1, 2006.
Y. Wang et al., “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output down to 13.9 nm and gain down to 10.9 nm,” Phys. Rev. A 72, 053807 (2005).
Y. Liu et al., “Achievement of essentially full spatial coherence in a high-average-power soft x-ray laser,” Physical Review A, vol. 63, 033802 (2001).
Bloom et al., X-Ray Nanoplasma Instruments and Tools, May 10, 2005, SPIE vol. 5752, pp. 782-789.
Benware et al., Applications of a high repetition rate table top soft x-ray laser: laser ablation with a focused beam and reflectometry of materials, Jul. 1999, SPIE vol. 3776, pp. 204-211.
Juha et al., Ablation of PMMA, PTFE, and Si by soft x-rays emitted from hot dense plasma, 2002, SPIE vol. 4760, pp. 1098-1105.
Yun et al., Nanometer focusing of hard x rays by phase zone plates, May 1999, Review of Scientific Instruments vol. 70 No. 5, pp. 2238-2241.
Non-Final Office Action, U.S. Appl. No. 11/840,898, pp. 1-40.
Non-Final Office Action, U.S. Appl. No. 11/840,898, pp. 1-11.
Final Office Action, U.S. Appl. No. 11/840,898, pp. 1-14.

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