Coating processes – Direct application of electrical – magnetic – wave – or...
Reexamination Certificate
2007-10-31
2010-06-29
Fletcher, III, William Phillip (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
C427S458000, C427S598000, C427S256000, C427S128000, C977S850000, C977S857000, C977S860000, C977S862000, C977S863000, C977S878000, C977S882000, C977S884000, C977S885000, C977S886000
Reexamination Certificate
active
07744963
ABSTRACT:
In one aspect, a method of nanolithography is provided, the method comprising providing a substrate; providing a scanning probe microscope tip; coating the tip with a deposition compound; and subjecting said coated tip to a driving force to deliver said deposition compound to said substrate so as to produce a desired pattern. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.
REFERENCES:
patent: 4987312 (1991-01-01), Eigler
patent: 5936237 (1999-08-01), van der Weide
patent: 09-251979 (1997-09-01), None
patent: WO 00/41213 (2000-07-01), None
Jaschke et al., “Deposition of Organic Material by the Tip of a Scanning Force Microscope,” Langmuir 1995, 11, 1061-1064.
Kuramochi et al., “Local Hydride Formation of the Si(111)-(7×7) Surface by Hydrogen Atoms Deposited from a Scanning Tunneling Microscope Tip,” Physical Review Letters, vol. 72, No. 6, Feb. 7, 1994, pp. 932-935.
Dravid Vinayak P.
Hong Seunghun
Mirkin Chad A.
Fletcher, III William Phillip
Foley & Lardner LLP
Northwestern University
LandOfFree
Nanolithography methods and products therefor and produced... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Nanolithography methods and products therefor and produced..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nanolithography methods and products therefor and produced... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4150277