Nanolithography methods and products therefor and produced...

Coating processes – Direct application of electrical – magnetic – wave – or...

Reexamination Certificate

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C427S458000, C427S598000, C427S256000, C427S128000, C977S850000, C977S857000, C977S860000, C977S862000, C977S863000, C977S878000, C977S882000, C977S884000, C977S885000, C977S886000

Reexamination Certificate

active

07744963

ABSTRACT:
In one aspect, a method of nanolithography is provided, the method comprising providing a substrate; providing a scanning probe microscope tip; coating the tip with a deposition compound; and subjecting said coated tip to a driving force to deliver said deposition compound to said substrate so as to produce a desired pattern. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.

REFERENCES:
patent: 4987312 (1991-01-01), Eigler
patent: 5936237 (1999-08-01), van der Weide
patent: 09-251979 (1997-09-01), None
patent: WO 00/41213 (2000-07-01), None
Jaschke et al., “Deposition of Organic Material by the Tip of a Scanning Force Microscope,” Langmuir 1995, 11, 1061-1064.
Kuramochi et al., “Local Hydride Formation of the Si(111)-(7×7) Surface by Hydrogen Atoms Deposited from a Scanning Tunneling Microscope Tip,” Physical Review Letters, vol. 72, No. 6, Feb. 7, 1994, pp. 932-935.

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