Nano-size semiconductor component and method of making

Semiconductor device manufacturing: process – Making field effect device having pair of active regions...

Reexamination Certificate

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C435S105000, C435S091500, C435S091500, C435S091500, C435S268000, C435S931000, C435S965000

Reexamination Certificate

active

06939748

ABSTRACT:
A method is disclosed for making a nano-size semiconductor component within a wide-bandgap semiconductor substrate. A first thermal energy beam is directed onto a first portion of the wide-bandgap semiconductor substrate to change the structure of the wide-bandgap semiconductor substrate into a first element of the semiconductor component. A second thermal energy beam is directed onto a second portion of the wide-bandgap semiconductor substrate adjacent to the first portion to form a second element of the semiconductor component.

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