Nano imprint master and method of manufacturing the same

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S313000

Reexamination Certificate

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07968253

ABSTRACT:
A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.

REFERENCES:
patent: 5925259 (1999-07-01), Biebuyck et al.
patent: 2001/0003384 (2001-06-01), Morita
patent: 2005/0159019 (2005-07-01), Lee
patent: 2005/0167894 (2005-08-01), Shih et al.
patent: 2006/0240335 (2006-10-01), Mitsui

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