Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-05-03
2011-05-03
Pham, Hoai V (Department: 2892)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S288000, C257S367000, C257SE27124, C438S022000, C438S039000
Reexamination Certificate
active
07936019
ABSTRACT:
A power source and methods thereof includes a structure comprising one or more p type layers, one or more n type layers, and one or more intrinsic layers and at least one source of radiation is disposed on at least a portion of the structure. Each of the p type layers is separated from each of the n type layers by one of the intrinsic layers.
REFERENCES:
patent: 4178524 (1979-12-01), Ritter
patent: 5132763 (1992-07-01), Maserjian
patent: 5260621 (1993-11-01), Little et al.
patent: 5440187 (1995-08-01), Little et al.
patent: 5590162 (1996-12-01), Terhune et al.
patent: 5595607 (1997-01-01), Wenham et al.
patent: 5642014 (1997-06-01), Hillenius
patent: 5859484 (1999-01-01), Mannil et al.
patent: 6329587 (2001-12-01), Shoga
patent: 6841411 (2005-01-01), Varghese
patent: 6949865 (2005-09-01), Gadeken
Pfann & Van Roosbroeck, “Radioactive and Photoelectricp-nJunction Power Sources,”Journal of Applied Physics25(11):1422-1434 (1954).
Rybicki, “Silicon Carbide Alphavoltaic Battery,”Proceedings of the 25th IEEE Photovoltaic Specialists Conferencepp. 93-96 (1996).
Raffaelle Ryne P.
Wilt David
Glenn Research Center
LeClairRyan
Pham Hoai v
Rochester Institute of Technology
Ullah Elias
LandOfFree
Nano and MEMS power sources and methods thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Nano and MEMS power sources and methods thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nano and MEMS power sources and methods thereof will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2672518