Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate
2003-10-23
2008-09-02
Luu, Chuong A. (Department: 2892)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
Insulated gate formation
C438S257000, C438S266000, C438S211000
Reexamination Certificate
active
07419895
ABSTRACT:
Methods and apparatus are provided. A source slot and a drain contact region are formed at opposite ends of a NAND string disposed on a substrate of a NAND memory array using a single mask. The drain contact region is self-aligned to a drain select gate. The NAND string has a plurality of memory cells connected in series.
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Leffert Jay & Polglaze P.A.
Luu Chuong A.
Micro)n Technology, Inc.
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