N,N-disubstituted sulfonamides and radiation-sensitive mixture p

Details N,N-disubstituted sulfonamides and radiation-sensitive mixture p N,N-disubstituted sulfonamides and radiation-sensitive mixture p

1994-08-08

1997-03-18

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302811, 430326, G03C 1492, G03C 1494, G03C 176, G03C 1725

Patent

active

056121695

ABSTRACT:
The invention relates to N,N-disubstituted sulfonamides of the formulae R.sup.1 [--N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 ].sub.n (I) and R.sup.1 [--SO.sub.2 --N(CO--OR.sup.2)--R.sup.3 ].sub.n (II), in which R.sup.1 --for n=1--is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14) aryl or (C.sub.7 -C.sub.20)aralkyl radial, for n>1--the 2-, 3- or 4-valent radical of a (C.sub.1 -C.sub.20)alkane or (C.sub.6 -C.sub.7)cycloalkane, a non-condensed or condensed mono- or polynuclear (C.sub.6 -C.sub.18)aromatic compound, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11)alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical. The invention further relates to a positive radiation-sensitive mixture containing a) a compound which under the influence of actinic radiation forms acid, b) an acid-cleavable compound whose cleavage products in an aqueous alkaline developer have a higher solubility than the starting compound, and c) a polymeric binder which is insoluble in water but is soluble or at least swellable in aqueous alkaline solutions, in which the compound b) is a sulfonamide of the formula I or II. The mixture according to the invention is particularly suitable for the manufacture of offset printing plates and photoresists.

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