Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1982-09-13
1984-06-12
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430275, 430271, 430910, 430905, 430281, 430288, 430926, 430916, 20415923, 20415924, G03C 168, G03C 194, G03C 176
Patent
active
044542186
ABSTRACT:
Photopolymerizable compositions comprising (a) at least one ethylenically unsaturated compound, (b) at least one photoinitiator or photoinitiator system, (c) sensitizing amount of an N-alkylindolylidene or N-alkylbenzothiazolylidene alkanone as defined, and optionally (d) at least one organic polymeric binder. The compositions, in layer form are useful in printing plates, litho films, photoresists, solder mask and for making image proofs. The products show sensitization to visible light.
REFERENCES:
patent: 3479185 (1969-11-01), Chambers
patent: 3549367 (1970-12-01), Chang et al.
patent: 3652275 (1972-03-01), Baum et al.
patent: 3697280 (1972-10-01), Strilko
patent: 3870524 (1975-03-01), Watanabe et al.
patent: 3916069 (1975-10-01), Tiers et al.
patent: 4058443 (1977-11-01), Murata et al.
patent: 4062686 (1977-12-01), Van Allan et al.
patent: 4162162 (1979-07-01), Dueber
patent: 4258121 (1981-03-01), Kojima
patent: 4259432 (1981-03-01), Kondoh et al.
patent: 4284707 (1981-08-01), Nagasawa et al.
patent: 4290870 (1981-09-01), Kondoh et al.
patent: 4341860 (1982-07-01), Sysak
"Spectrum" pp. 1432-1433, The Focal Encyclopedia of Photography (Desk Edition), McGraw-Hill Book Company, New York, 1969.
Dueber Thomas E.
Link, deceased William J.
E. I. Du Pont de Nemours and Company
Hamilton Cynthia
Kittle John E.
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