Multiple technology node mask

Details Multiple technology node mask Multiple technology node mask

2011-08-30

2011-08-30

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

08007966

ABSTRACT:
A method of fabricating a mask set is provided. The method includes providing mask data associated with a plurality of mask layers. The mask data includes a first pattern associated with a first technology node and a second pattern associated with a second technology node. The method continues with determining to form a multi-technology node mask (MTM) for a first mask layer of the plurality of mask layers. The MTM for the first mask layer is formed, which includes features associated with the first pattern and features associated with the second pattern.

REFERENCES:
patent: 5995200 (1999-11-01), Pierrat
patent: 6040892 (2000-03-01), Pierrat
patent: 6710851 (2004-03-01), Elmer et al.
patent: 2003/0224148 (2003-12-01), Tsai et al.
patent: 2006/0026549 (2006-02-01), Tsao et al.
Non-Final Action dated May 10, 2010, U.S. Appl. No. 12/056,897, 9 pages.

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