Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-01-25
2011-01-25
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C430S394000
Reexamination Certificate
active
07875406
ABSTRACT:
A multiple technology node mask (MTM) is provided. An MTM includes a pattern associated with a first technology node and a pattern associated with a second technology node. The first technology node and the second technology node may be different. For example, the first technology node may be a main node and the second technology node a sub-node. A mask set including an MTM may also include single technology node masks (STMs) for mask layers in which the first technology node and second technology node and/or the patterns associated with each are not compatible. A single mask set including MTM and STMs, may be used to produce a plurality of devices, each on a different wafer.
REFERENCES:
patent: 5995200 (1999-11-01), Pierrat
patent: 6040892 (2000-03-01), Pierrat
patent: 6710851 (2004-03-01), Elmer et al.
patent: 2003/0224148 (2003-12-01), Tsai et al.
patent: 2006/0026549 (2006-02-01), Tsao et al.
Liang Che-Rong
Lin Feng Lung
Tsai Fei-Gwo
Wu Kuan Liang
Haynes and Boone LLP
Rosasco Stephen
Taiwan Semiconductor Manufacturing Company , Ltd.
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