Multiple step trench etching process

Details Multiple step trench etching process Multiple step trench etching process

1986-07-21

1988-03-08

Bashore, S. Leon

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156648, 156651, 1566591, 156662, B44C 122, H01L 21308

Patent

active

047298154

ABSTRACT:
A process having three steps to etch a vertical trench with rounded top corners and rounded bottom corners. The first step involves anisotropically etching a vertical trench through an opening in a masking layer to approximately 85 to 90% of the final trench depth to give a trench with sharp or abrupt top corners and sharp bottom corners. The second step rounds the top corners and the third step extends the trench depth and provides rounded bottom corners. Using CHF.sub.3 as an etch species and adjusting the DC bias differently for each step gives better profile control and better critical dimension (CD) control.

REFERENCES:
patent: 3412295 (1968-11-01), Grebene
patent: 4484979 (1984-11-01), Stocker
patent: 4495025 (1985-01-01), Haskell
patent: 4529475 (1985-07-01), Okano et al.
patent: 4534826 (1985-08-01), Goth et al.
patent: 4578128 (1986-03-01), Mundt et al.
Clark, "Reactive Ion-Etch Process for Etched Sidewall Tailoring", IBM TDB, vol. 19, No. 11, Apr. 1977.

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