Multiple shadow mask structure for deposition shadow mask...

Details Multiple shadow mask structure for deposition shadow mask... Multiple shadow mask structure for deposition shadow mask...

2007-09-18

2007-09-18

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S679000, C257SE21023, C257SE21231

Reexamination Certificate

active

10996142

ABSTRACT:
The present invention is a multi-layer shadow mask and method of use thereof. The multi-layer shadow mask includes a sacrificial mask bonded to a deposition mask. The sacrificial mask provides protection against an accumulation of evaporant on the deposition mask which would cause the deposition mask to deform.

REFERENCES:
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patent: 6156217 (2000-12-01), Hammel et al.
patent: 6187690 (2001-02-01), Rolfson
patent: 6696371 (2004-02-01), Butschke et al.
patent: 6819871 (2004-11-01), Baldwin et al.
patent: 2003/0193285 (2003-10-01), Kim

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