Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1998-02-05
1999-09-14
Gaffin, Jeffrey
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
279128, H02N 1300
Patent
active
059532009
ABSTRACT:
An electrostatic chuck device for clamping a semiconductor wafer substrate during processing of the semiconductor wafer includes a power source, at least one negative pole, and a plurality of positive poles. Each positive pole selected from the plurality of positive poles is electrically separated from the negative pole. Also provided is a plurality of fuses, each fuse of the plurality of fuses is coupled to an associated positive pole included in the plurality of positive poles. Each fuse is further coupled to the power source. In some embodiments, each positive pole is electrically separated from the negative pole by an insulating epoxy. In other embodiments, the plurality of positive poles are connected to each other in parallel.
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John Field, "Wafer Temperature Control: Advanced Solutions for Next Generation Manufacturing", Oct. 14, 1997, Lam Research Corp., Fremont, Ca.
Haley Mark W.
Liu Albert H.
Gaffin Jeffrey
Huynh Kim
VLSI Technology Inc.
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