Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1999-01-04
2000-08-29
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430394, G03F 900, G03C 500
Patent
active
061106240
ABSTRACT:
A patterned mask and method of forming a patterned mask over a substrate, comprising forming a first resist layer over the substrate, forming a second resist layer over the first resist layer, patterning the first resist using energy selective to the first resist layer to form a first patterned resist, and patterning the second resist using energy selective to the second resist layer to form a second patterned resist, wherein the first patterned resist and the second patterned resist form the patterned mask.
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IBM Technical Disclosure Bulletin, Portable Intimately Contacted Mask, Lin, B.J., vol. 21, No. 5, Oct. 1978.
Moreau, Wayne, M., Semiconductor Lithography Principles, Practices, and Materials, 1998, Plenum Press, pp. 253, 320, 321, 584-587, 589.
Hibbs Michael S.
Neary Timothy E.
O'Grady David S.
Rigaill Denis M.
International Business Machines - Corporation
Rosasco S.
Walter, Jr. Howard J.
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