Multiple loadlock system

Semiconductor device manufacturing: process – Continuous processing

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Details

438908, 438758, H01L 2131, H01L 21469

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active

060340002

ABSTRACT:
A semiconductor processing system having a holding chamber coupled to a mainframe processing system and at least one loadlock chamber coupled to the holding chamber in which unprocessed wafers are transferred from the loadlock chamber to the holding chamber for subsequent processing by the mainframe system.

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"Dry Etching Systems: Gearing Up for Larger Wafers", Semiconductor International Magazine, pp. 48-60, Oct. 1985.

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